DocumentCode :
2637098
Title :
Concurrent technology, device, and circuit development for EEPROMs
Author :
Feldmann, U. ; Kakoschke, R. ; Miura-Mattausch, M. ; Schraud, G.
Author_Institution :
Corp. Technol., Siemens AG, Munich, Germany
fYear :
1998
fDate :
10-13 Feb 1998
Firstpage :
123
Lastpage :
128
Abstract :
Concurrent engineering aims at integrating technology, device and circuit development in parallel. We will show here an example for an EEPROM development case, which has been realized with a transient circuit simulator. A precise unified EEPROM model was developed describing all characteristics with surface potentials dependent on technological parameters. This new exact model enabled us to realize all requested goals from the first wafer run
Keywords :
EPROM; circuit CAD; circuit analysis computing; concurrent engineering; EEPROM development; circuit simulator; concurrent engineering; exact model; transient circuit simulator; unified EEPROM model; Circuit simulation; Circuit synthesis; Concurrent engineering; Costs; EPROM; Nonvolatile memory; Pulse measurements; Semiconductor device modeling; Threshold voltage; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference 1998. Proceedings of the ASP-DAC '98. Asia and South Pacific
Conference_Location :
Yokohama
Print_ISBN :
0-7803-4425-1
Type :
conf
DOI :
10.1109/ASPDAC.1998.669423
Filename :
669423
Link To Document :
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