Title :
Measurements Of Operating And Bias Voltages Of A Parallel Plate RF Discharge With A Magnetic Field Parallel To The Driven Electrode.
Author_Institution :
Aero Propulsion and Power Directorate
Keywords :
Electrodes; Electrons; Etching; Gases; Ionization; Magnetic field measurement; Magnetic fields; Radio frequency; Substrates; Voltage;
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
DOI :
10.1109/PLASMA.1992.697755
