Title :
A structure of millimeter-wave on-chip transmission line using redistributed copper wire and ground shield
Author :
Kuramoto, Takafumi ; Sakamoto, Takehiko ; Namba, Hiroaki ; Hashimoto, Takasuke ; Uchida, Shinichi ; Hayashi, Kenji ; Furumiya, Masayuki ; Ohkubo, Hiroaki ; Nakashiba, Yasutaka
Author_Institution :
Renesas Electron. Corp., Kawasaki, Japan
Abstract :
This paper presents a structure of millimeter-wave (mmW) on-chip transmission line using redistributed thick copper wires with ground shields. All the layers from standard BEOL layers to the aluminum pad layer can be selected as the ground shield. From electromagnetic field simulations and measurements up to 80 GHz, we prove that global-copper-wire ground shields produce minimum attenuation: less than 0.5 dB/mm at 60 GHz. This stands comparison with transmission lines on SOI substrate or gold-wire transmission lines on GaAs semi-insulating substrate. An mmW silicon on-chip transmission line on a standard 40 nm CMOS process was fabricated successfully.
Keywords :
CMOS integrated circuits; copper; field effect MIMIC; high-frequency transmission lines; millimetre wave measurement; wires; CMOS process; SOI substrate; aluminum pad layer; electromagnetic field simulations; frequency 60 GHz; global-copper-wire ground shields; gold-wire transmission lines; millimeter-wave silicon on-chip transmission line; redistributed copper wire; redistributed thick copper wires; semiinsulating substrate; size 40 nm; standard BEOL layers; Attenuation; Coplanar waveguides; Power transmission lines; Silicon; Substrates; Transmission line measurements; Wires; CMOS; coplanar wave guide; ground shield; losses; millimeter wave; silicon; transmission line;
Conference_Titel :
Radio Frequency Integrated Circuits Symposium (RFIC), 2012 IEEE
Conference_Location :
Montreal, QC
Print_ISBN :
978-1-4673-0413-9
Electronic_ISBN :
1529-2517
DOI :
10.1109/RFIC.2012.6242300