DocumentCode
2643485
Title
Peering through the technology scaling fog
Author
Mayberry, Mike
Author_Institution
Components Res., Intel Corp., Hillsboro, OR, USA
fYear
2012
fDate
12-14 June 2012
Firstpage
1
Lastpage
4
Abstract
While walking in the fog, the path nearest you is relatively clear and then options broaden and become less clear as you peer further away. This paper will discuss which parts of the technology path forward are predictable and where inflection points may occur which require doing things differently. It is clear that many choices will need to be made in the next few years to be ready for technology in 2020 and beyond.
Keywords
CMOS integrated circuits; integrated circuit interconnections; CMOS; inflection point; integration; interconnects; technology path forward; technology scaling fog; CMOS integrated circuits; Computer architecture; Dielectrics; Logic gates; Performance evaluation; Silicon; CMOS; NRI; devices; integration; interconnects;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology (VLSIT), 2012 Symposium on
Conference_Location
Honolulu, HI
ISSN
0743-1562
Print_ISBN
978-1-4673-0846-5
Electronic_ISBN
0743-1562
Type
conf
DOI
10.1109/VLSIT.2012.6242434
Filename
6242434
Link To Document