DocumentCode
2644164
Title
A highly pitch scalable 3D vertical gate (VG) NAND flash decoded by a novel self-aligned independently controlled double gate (IDG) string select transistor (SSL)
Author
Chen, Chih-Ping ; Lue, Hang-Ting ; Chang, Kuo-Pin ; Hsiao, Yi-Hsuan ; Hsieh, Chih-Chang ; Chen, Shih-Hung ; Shih, Yen-Hao ; Hsieh, Kuang-Yeu ; Yang, Tahone ; Chen, Kuang-Chao ; Lu, Chih-Yuan
Author_Institution
Emerging Central Lab., Macronix Int. Co., Ltd., Hsinchu, Taiwan
fYear
2012
fDate
12-14 June 2012
Firstpage
91
Lastpage
92
Abstract
Despite vertical stacking, the lateral scaling of 3D NAND Flash is critically important because otherwise >;16 stacking layers are needed to be cost competitive to 20nm 2D NAND. In this work, we propose a 3D vertical gate (VG) NAND using a self-aligned independently controlled double gate (IDG) string select transistor (SSL) decoding method. The IDG SSL provides excellent program inhibit and read selection without any penalty of cell size increase, making our 3D VG NAND cell as scalable as conventional 2D NAND. We present the world´s first <; 50nm (37.5nm) half-pitch 3D NAND. The BL decoding and page operation methods are illustrated in detail. This highly pitch scalable VG with IDG SSL approach provides a very cost competitive 3D NAND.
Keywords
NAND circuits; flash memories; thin film transistors; 2D NAND; 3D VG NAND cell; BL decoding; IDG-SSL decoding method; half-pitch TFT devices; highly pitch scalable 3D vertical gate NAND flash memory; page operation methods; self-aligned independently controlled double gate string select transistor; size 20 nm; Arrays; Decoding; Layout; Logic gates; Thin film transistors; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology (VLSIT), 2012 Symposium on
Conference_Location
Honolulu, HI
ISSN
0743-1562
Print_ISBN
978-1-4673-0846-5
Electronic_ISBN
0743-1562
Type
conf
DOI
10.1109/VLSIT.2012.6242476
Filename
6242476
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