DocumentCode
2644470
Title
Sub-fM DNA sensitivity by self-aligned maskless thin-film transistor-based SoC bioelectronics
Author
Chen, Min-Cheng ; Lin, Chang-Hsien ; Lin, Chia-Yi ; Hsueh, Fu-Kuo ; Huang, Wen-Hsien ; Lien, Yu-Chung ; Chen, Hsiu-Chih ; Hsueh, Hsiao-Ting ; Huang, Che-Wei ; Lin, Chih-Ting ; Liu, Yin-Chih ; Lee, Ta-Hsien ; Hua, Mu-Yi ; Qiu, Jian-Tai ; Liu, Mao-Chen ; Le
Author_Institution
Nat. Nano Device Labs., Hsinchu, Taiwan
fYear
2012
fDate
12-14 June 2012
Firstpage
127
Lastpage
128
Abstract
This is the first study to successfully achieve record DNA sensitivity (sub-fM) by self-aligned, maskless, dual-channel, and metal-gate-based thin-film transistor nano-wire FET. Both novel device architecture (dual-channel) and optimization of integration processes (microcrystalline silicon and self-aligned sidewall sub-50 nm critical dimension) of nano-wire FET enhance the sensitivity to biological entities substantially. Meanwhile, the proposed device is accomplished with an embedded VLSI CMOS circuit. It can thus offer high application potential to pH, protein, and DNA probing in SoC-based portable bioelectronics.
Keywords
CMOS integrated circuits; DNA; VLSI; biomolecular electronics; embedded systems; field effect transistors; nanowires; pH; proteins; system-on-chip; thin film transistors; DNA probing; SoC-based portable bioelectronics; biological entities; device architecture; dual-channel thin-film transistor; embedded VLSI CMOS circuit; integration process; metal-gate-based thin-film transistor; microcrystalline silicon; nano-wire FET; pH; protein; self-aligned maskless thin-film transistor; self-aligned sidewall; size 50 nm; subfM DNA sensitivity; CMOS integrated circuits; DNA; FETs; Logic gates; Nanobioscience; Nanoscale devices; Sensitivity;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology (VLSIT), 2012 Symposium on
Conference_Location
Honolulu, HI
ISSN
0743-1562
Print_ISBN
978-1-4673-0846-5
Electronic_ISBN
0743-1562
Type
conf
DOI
10.1109/VLSIT.2012.6242494
Filename
6242494
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