DocumentCode :
2645696
Title :
Parametric investigation of a mid frequency internal oscillating currents driven plasma reactor
Author :
YuPing, Ren ; JiDong, Long ; QiJin, Cheng ; Rutkevych, P.P. ; Tao, Zhang ; Xu, S.
Author_Institution :
Nat. Inst. of Educ., Nanyang Technol. Univ.
fYear :
2006
fDate :
4-8 June 2006
Firstpage :
104
Lastpage :
104
Abstract :
Summary form only given. A novel inductively coupled mid frequency (2 MHz) plasma source with orthogonal coil configuration is presented. The inductive coil consists of two perpendicular copper rod layers inside the chamber to improve the power transfer efficiency and uniformity of plasma. The results of magnetic field distribution under low and high plasma density are reported in detail. It shows that the radial uniformity of magnetic field and plasmas is enhanced significantly compared with that of external planar coil in 460 kHz frequency. Depending on the input power, the plasma source can operate in either the electrostatic (E) mode or electromagnetic (H) mode discharge. It is interesting that the mode transition can be continuous or discrete. The mode transition jump is obvious in 460 kHz with the same inductive coil and chamber. Furthermore, the required input power to initiate the discharge is observed remarkably low (10 W) in the present chamber with a volume of 18.5 litres
Keywords :
high-frequency discharges; plasma density; plasma oscillations; plasma sources; plasma transport processes; 10 W; 2 MHz; 460 kHz; copper rod layers; electromagnetic mode discharge; electrostatic mode discharge; inductively coupled plasma source; magnetic field distribution; midfrequency internal oscillating currents; orthogonal coil; plasma density; plasma reactor; plasma uniformity; power transfer efficiency; Coils; Copper; Educational technology; Electrostatics; Fault location; Frequency; Inductors; Magnetic fields; Plasma density; Plasma sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location :
Traverse City, MI
Print_ISBN :
1-4244-0125-9
Type :
conf
DOI :
10.1109/PLASMA.2006.1706976
Filename :
1706976
Link To Document :
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