Title :
Plasma and beam dynamics in selfmagneticpinch electron beam diodes
Author :
Rose, D.V. ; Welch, D.R. ; Genoni, T.C. ; Threadgold, J. ; Oliver, B.V. ; Portillo, S. ; Hinshelwood, D.D. ; Mosher, D.
Author_Institution :
Voss Sci., LLC, Albuquerque, NM
Abstract :
Summary form only given. The self-magnetic-pinch diode is being developed as an intense electron beam source for high-power X-ray radiography. The diode geometry includes a ~5-cm long tapered cathode stalk, ~4-mm radius, with a rounded and hollow tip from which a high-current hollow electron beam is emitted. The beam is accelerated and focuses across a small (<1 cm) vacuum gap to a high-atomic-number planar target (anode) from which bremsstrahlung radiation is produced. This diode has been experimentally optimized for electrical operating parameter ranges of 1-5 MV, >50 kA, and pulse widths of 10-50 ns. Experimental data suggests that the hollow cathode region acts to inhibit the enhancement of bipolar flow by expanding electrode plasmas, thus extending the impedance lifetime of the diode. Hybrid electromagnetic particle-in-cell simulations are being used to study the dynamical evolution of cathode and anode plasmas in several of the experimentally tested cathode configurations. Computational models of plasma evolution from solid surfaces are presently under development that will allow detailed comparisons with measured data including electron beam spot size on the anode and temporal impedance history
Keywords :
bremsstrahlung; electron beams; pinch effect; plasma diodes; plasma flow; plasma simulation; plasma-beam interactions; 1 to 5 MV; 10 to 50 ns; X-ray radiography; anode; beam dynamics; bipolar flow; bremsstrahlung radiation; electromagnetic particle-in-cell simulations; electron beam spot size; expanding electrode plasmas; hollow cathode; impedance lifetime; planar target; plasma dynamics; self-magnetic-pinch electron beam diodes; tapered cathode stalk; vacuum gap; Anodes; Cathodes; Computational modeling; Diodes; Electron beams; Particle beams; Plasma measurements; Plasma simulation; Plasma sources; Surface impedance;
Conference_Titel :
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location :
Traverse City, MI
Print_ISBN :
1-4244-0125-9
DOI :
10.1109/PLASMA.2006.1706988