• DocumentCode
    2645871
  • Title

    Plasma and beam dynamics in selfmagneticpinch electron beam diodes

  • Author

    Rose, D.V. ; Welch, D.R. ; Genoni, T.C. ; Threadgold, J. ; Oliver, B.V. ; Portillo, S. ; Hinshelwood, D.D. ; Mosher, D.

  • Author_Institution
    Voss Sci., LLC, Albuquerque, NM
  • fYear
    2006
  • fDate
    4-8 June 2006
  • Firstpage
    116
  • Lastpage
    116
  • Abstract
    Summary form only given. The self-magnetic-pinch diode is being developed as an intense electron beam source for high-power X-ray radiography. The diode geometry includes a ~5-cm long tapered cathode stalk, ~4-mm radius, with a rounded and hollow tip from which a high-current hollow electron beam is emitted. The beam is accelerated and focuses across a small (<1 cm) vacuum gap to a high-atomic-number planar target (anode) from which bremsstrahlung radiation is produced. This diode has been experimentally optimized for electrical operating parameter ranges of 1-5 MV, >50 kA, and pulse widths of 10-50 ns. Experimental data suggests that the hollow cathode region acts to inhibit the enhancement of bipolar flow by expanding electrode plasmas, thus extending the impedance lifetime of the diode. Hybrid electromagnetic particle-in-cell simulations are being used to study the dynamical evolution of cathode and anode plasmas in several of the experimentally tested cathode configurations. Computational models of plasma evolution from solid surfaces are presently under development that will allow detailed comparisons with measured data including electron beam spot size on the anode and temporal impedance history
  • Keywords
    bremsstrahlung; electron beams; pinch effect; plasma diodes; plasma flow; plasma simulation; plasma-beam interactions; 1 to 5 MV; 10 to 50 ns; X-ray radiography; anode; beam dynamics; bipolar flow; bremsstrahlung radiation; electromagnetic particle-in-cell simulations; electron beam spot size; expanding electrode plasmas; hollow cathode; impedance lifetime; planar target; plasma dynamics; self-magnetic-pinch electron beam diodes; tapered cathode stalk; vacuum gap; Anodes; Cathodes; Computational modeling; Diodes; Electron beams; Particle beams; Plasma measurements; Plasma simulation; Plasma sources; Surface impedance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
  • Conference_Location
    Traverse City, MI
  • Print_ISBN
    1-4244-0125-9
  • Type

    conf

  • DOI
    10.1109/PLASMA.2006.1706988
  • Filename
    1706988