DocumentCode
2647307
Title
Atmospheric continuous filament discharge plasma (ACFDP) applied to crop sterilizatinon
Author
Liu, Liang ; Zhang, Guixin ; Zhijie Zhu ; Haiguang Wang ; Ma, Zhanhong
Author_Institution
Dept. of Electr. Eng., Tsinghua Univ., Beijing
fYear
2006
fDate
4-8 June 2006
Firstpage
187
Lastpage
187
Abstract
Summary form only given. The ability of killing some microorganisms by atmospheric pressure glow discharges (APGD) has been demonstrated in a number of previous researches and can be extensively applied to medical treatment, sanitation, environmental protection and food reservation. At present, we designed a set of plasma device, which produce the dielectric barrier discharge plasma between the coaxial bar electrode and barrel electrode. This device adopts alternating current supply of 10 kHz to produce atmospheric continuous filament discharges plasma (ACFDP) at the gap distance of 5 mm and voltage of 15 kV. Because of the high exciting frequency, the plasma is generated constantly. We install nine of these devices in parallel and the applied power required to sustain stable discharges is around 400 W. When working gas (nitrogen, air, helium, etc) is inflated at a relatively high speed, the particle density decreases and the evenness degree of plasma increases, which is similar to the glow discharge. We use this plasma to treat some bacteria and fungus in crops, especially in wheat and the sterilization result is demonstrated to be remarkable
Keywords
crops; glow discharges; microorganisms; plasma applications; plasma density; plasma devices; plasma sources; 10 kHz; 15 kV; 5 mm; atmospheric pressure glow discharges; bacteria; barrel electrode; coaxial bar electrode; continuous filament discharge plasma; crop sterilization; dielectric barrier discharge plasma; environmental protection; exciting frequency; food reservation; fungus; medical treatment; microorganisms; particle density; plasma device; sanitation; wheat; Atmospheric-pressure plasmas; Biomedical electrodes; Crops; Glow discharges; Medical treatment; Microorganisms; Plasma density; Plasma devices; Plasma stability; Protection;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location
Traverse City, MI
Print_ISBN
1-4244-0125-9
Type
conf
DOI
10.1109/PLASMA.2006.1707059
Filename
1707059
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