Title :
Brightness characteristics for the input frequency of an large size external electrode fluorescent lamp (EEFL)
Author :
Lee, Seong-Jin ; Choi, Yong-Sung ; Lee, Jong-Chan ; Park, Dae-Hee
Author_Institution :
Wonkwang Univ., Ihksan
Abstract :
Summary form only given. Because external electrode fluorescent lamps (EEFLs) have the advantage of a long lifetime in the early stages of the study on plasma discharge, interest in the lamp continues. Studies on the operation of external electrode fluorescent lamps have focused mainly on its use of a type of high frequency (MHz). By performing high brightness using a square wave operation method with the low frequency below 100 kHz, which is applied to a narrowed tube type lamp that has several mm of lamp diameter, an EEFL presented the possibility of using it as a light source for backlights. However, because an EEFL generates plasma using wall charges, which considers the impedance characteristics of glass based on the structural principle in discharge, it can be significantly affected by frequency. Thus, this study verifies the change in the characteristics of electromagnetic fields according to the change in frequency through a Maxwell´s electromagnetic field simulation and examines the relationship between the change in the EEFL frequency and brightness by measuring the optical characteristics. In addition, the characteristics of the transformation of energy orbits were verified by investigating the characteristics of the wavelength according to the change in frequency through the OES
Keywords :
Maxwell equations; brightness; discharges (electric); fluorescent lamps; plasma diagnostics; plasma electromagnetic wave propagation; plasma simulation; plasma sources; Maxwell electromagnetic field simulation; brightness; energy orbit transformation; external electrode fluorescent lamp; impedance; light source; optical characteristics; plasma discharge; wall charges; Brightness; Character generation; Electrodes; Electromagnetic fields; Fluorescent lamps; Frequency; Light sources; Plasma properties; Plasma simulation; Plasma waves;
Conference_Titel :
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location :
Traverse City, MI
Print_ISBN :
1-4244-0125-9
DOI :
10.1109/PLASMA.2006.1707063