DocumentCode :
2648154
Title :
High efficiency for dioxin dehalogenazation using an electron source with a carbon nanotube
Author :
Yamaura, Michiteru ; Uchida, Shigeaki ; Shimada, Yoshinori ; Yamanaka, Chiyoe
Author_Institution :
Inst. for Laser Technol., Osaka
fYear :
2006
fDate :
4-8 June 2006
Firstpage :
227
Lastpage :
227
Abstract :
Summary form only given. We propose the application of an electron source with a carbon nanotube (CNT) for the dehalogenation of dioxin. The dioxin consists of some amount of chlorine. As the chlorine content is increased, a highly poisonous dioxin is produced. It is clarified that a lot of electron supply around the chlorine is treated on dioxin by dehalogenation due to the electron affinity of chlorine is very strong. Moreover, the dehalogenation treats on the dioxin without producing any by-products. To date, it has been confirmed that o-chlorophenol consists of a hydroxyl group, chlorine molecule, and benzene ring; further, the procession materials of dioxin is dehalogenated by utilizing electrons generated around a non-equilibrium plasma. However, a rate of approximately 50% is not expected to be found for the dehalogenation because the number of electrons supplied by the non-equilibrium plasma is low. It is well known that the CNTs have a high aspect ratio, high mechanical strength, and good chemical stability. Hence, the rate of dehalogenation drastically increases due to the abundant supply of electrons when a CNT electron source is used. The dehalogenation of o-chlorophenol using the CNT electron sources and the characterizations of the CNT will be discussed
Keywords :
carbon nanotubes; electron affinity; plasma chemistry; plasma materials processing; reaction kinetics; aspect ratio; benzene ring; carbon nanotube; chemical stability; chlorine molecule; dioxin dehalogenation; electron affinity; electron source; hydroxyl group; mechanical strength; nonequilibrium plasma; o-chlorophenol; Carbon nanotubes; Chemicals; Electron sources; Plasma chemistry; Plasma materials processing; Plasma sources; Plasma stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. The 33rd IEEE International Conference on
Conference_Location :
Traverse City, MI
Print_ISBN :
1-4244-0125-9
Type :
conf
DOI :
10.1109/PLASMA.2006.1707099
Filename :
1707099
Link To Document :
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