Title :
Breakdown in SF6 influenced by corona-stabilization
Author :
Hinterholzer, Th ; Boeck, W.
Author_Institution :
Inst. of High Voltage Eng. & Electr. Power Transmission, Tech. Univ. of Munich, Germany
Abstract :
Corona-stabilization in SF6-insulated systems is a known phenomenon, but up to now not fully understood. In case of slow-rising impulse voltage stress, a stabilization mechanism, mainly depending on the steepness of the applied test voltage, occurs. Essential for the phenomenon is a space-charge accumulation in front of the probe tip. The space charge reduces the field near the rod and thus an increased voltage level is needed to initiate the leader process. This paper presents experimental results. An imaging system consisting of 2 still-video CCD cameras has been used to record the paths of spark breakdowns across a positive point/plane gap. With subsequent computer image processing and analysis the dimension of the space-charge cloud could be estimated. Studies have been done for various probe tip lengths, gas pressures and steepnesses of the applied test voltage. The probability of corona-stabilization was determined for each test sequence. It was found that this probability decreases with the steepness of the applied test voltage for certain gas pressures
Keywords :
SF6 insulation; corona; impulse testing; insulation testing; space charge; sparks; SF6; SF6-insulated systems; applied test voltage; corona-stabilization; gas pressures; leader process; positive point/plane gap; probability; probe tip; probe tip lengths; slow-rising impulse voltage stress; space-charge accumulation; space-charge cloud; spark breakdowns; stabilization mechanism; still-video CCD cameras; test sequence; voltage level; Charge coupled devices; Charge-coupled image sensors; Cloud computing; Electric breakdown; Impulse testing; Probes; Space charge; Sparks; Stress; Voltage;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 2000 Annual Report Conference on
Conference_Location :
Victoria, BC
Print_ISBN :
0-7803-6413-9
DOI :
10.1109/CEIDP.2000.885313