DocumentCode
2649783
Title
Electro-optic waveguide modulators fabricated using thin films of lithium niobate
Author
Rabiei, Payam ; Steier, William H.
Author_Institution
Dept. of Electr. Eng., Univ. of Southern California, Los Angeles, CA, USA
Volume
2
fYear
2005
fDate
22-27 May 2005
Firstpage
945
Abstract
Electro-optic ridge waveguide modulators based on sub-micron thin films of lithium niobate prepared by crystal ion slicing and wafer bonding are demonstrated. The modulators have low insertion loss and have VπL as low as 13 V-cm at λ=1.55 μm.
Keywords
electro-optical modulation; lithium compounds; optical fabrication; optical films; optical losses; optical waveguides; ridge waveguides; thin film devices; wafer bonding; 1.55 micron; crystal ion slicing; electro-optic waveguide modulator fabrication; insertion loss; lithium niobate; ridge waveguide modulator; sub-micron thin film; wafer bonding; Crystallization; Electrooptic modulators; High speed optical techniques; Lithium niobate; Optical films; Optical harmonic generation; Optical modulation; Optical waveguides; Transistors; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Print_ISBN
1-55752-796-2
Type
conf
DOI
10.1109/QELS.2005.1548991
Filename
1548991
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