Title :
A Plasma Etching Process Module For Fabrication Of High Frequency Buried Heterostructure Lasers
Author :
Meland, E. ; Holmstrom, R.P.
Author_Institution :
GTE Laboratories Incorporated, 40 Sylvan Road, Waltham, MA 02254
fDate :
29 Jul-2 Aug 1991
Keywords :
Bandwidth; Etching; Frequency; Indium phosphide; Optical device fabrication; Plasma applications; Plasma measurements; Plasma waves; Polymers; Resists;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.639000
