Title :
In-situ Processing Of GaAs/AiGaAs By Low Damage Selective Etching And Focussed Ion Beam Patterning
Author :
Skidmore, J.A. ; Spiers, G.D. ; English, J.H. ; Xu, Z. ; Green, D.L. ; Young, D.B. ; Coldren, L.A. ; Hu, E.L. ; Petroff, P.M.
Author_Institution :
University of California, Santa Barbara, CA 93106
fDate :
29 Jul-2 Aug 1991
Keywords :
Chemicals; Dry etching; Gallium arsenide; III-V semiconductor materials; Implants; Ion beams; Low voltage; Molecular beam epitaxial growth; Substrates; Surface contamination;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.639006
