• DocumentCode
    2651268
  • Title

    In-situ CI2 Thermal Etching Of GaAs/AiGaAs For Damage Removal In A Plasma Etcher

  • Author

    Lechaton, J.S. ; Buchmann, P. ; Dietrich, H.-P. ; Sasso, G. ; Vettiger, P. ; Webb, D.J.

  • Author_Institution
    IBM Research Division
  • fYear
    1991
  • fDate
    29 Jul-2 Aug 1991
  • Firstpage
    37
  • Lastpage
    38
  • Keywords
    Dry etching; Gallium arsenide; Mirrors; Optical waveguides; Plasma applications; Plasma devices; Plasma materials processing; Plasma temperature; Plasma waves; Sputter etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
  • Print_ISBN
    0-87942-618-7
  • Type

    conf

  • DOI
    10.1109/LEOSST.1991.639007
  • Filename
    639007
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2651268