DocumentCode
2651519
Title
RIBE And RIE For Micro Cavity Surface Emitting Lasers Technology And Damage Characterization
Author
Iga, K. ; Koyama, F. ; Matsutani, A.
Author_Institution
Tokyo Institute of Technology
fYear
1991
fDate
29 Jul-2 Aug 1991
Firstpage
39
Lastpage
40
Keywords
Chemicals; DH-HEMTs; Dry etching; Gallium arsenide; Indium phosphide; Microcavities; Nonhomogeneous media; Sputter etching; Surface emitting lasers; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN
0-87942-618-7
Type
conf
DOI
10.1109/LEOSST.1991.639008
Filename
639008
Link To Document