Title :
RIBE And RIE For Micro Cavity Surface Emitting Lasers Technology And Damage Characterization
Author :
Iga, K. ; Koyama, F. ; Matsutani, A.
Author_Institution :
Tokyo Institute of Technology
fDate :
29 Jul-2 Aug 1991
Keywords :
Chemicals; DH-HEMTs; Dry etching; Gallium arsenide; Indium phosphide; Microcavities; Nonhomogeneous media; Sputter etching; Surface emitting lasers; Vertical cavity surface emitting lasers;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.639008
