DocumentCode :
2651951
Title :
Reactive Ion Etching GaAs Vertical-cavity Surface Emitting Lasers
Author :
Choquette, Kent D. ; Hasnain, G. ; Wang, Y.H. ; Freund, R.S. ; Cho, A.Y. ; Leibenguth, R.E.
Author_Institution :
AT&T Bell Laboratories, Murray Hill NJ 07974
fYear :
1991
fDate :
29 Jul-2 Aug 1991
Firstpage :
41
Lastpage :
42
Keywords :
Anisotropic magnetoresistance; Distributed Bragg reflectors; Etching; Gallium arsenide; Optical materials; Pulse measurements; Radiative recombination; Ring lasers; Surface emitting lasers; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
Type :
conf
DOI :
10.1109/LEOSST.1991.639010
Filename :
639010
Link To Document :
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