DocumentCode
2652168
Title
Graphene for More Moore and More Than Moore applications
Author
Lemme, M.C. ; Vaziri, S. ; Smith, A.D. ; Li, J. ; Rodriguez, S. ; Rusu, A. ; Ostling, M.
Author_Institution
KTH R. Inst. of Technol., Kista, Sweden
fYear
2012
fDate
10-11 June 2012
Firstpage
1
Lastpage
3
Abstract
Graphene has caught the attention of the electronic device community as a potential future option for More Moore and More Than Moore devices and applications. This is owed to its remarkable material properties, which include ballistic conductance over several hundred nanometers or charge carrier mobilities of several 100.000 cm2/Vs in pristine graphene. Furthermore, standard CMOS technology may be applied to graphene in order to make devices. Integrated graphene devices, however, are performance limited by scattering due to defects in the graphene and its dielectric environment and high contact resistance. In addition, graphene has no energy band gap and hence graphene MOSFETs (GFETs) cannot be switched off, but instead show ambipolar behaviour. This has steered interest away from logic to analog radio frequency (RF) applications. This talk will systematically compare the expected RF performance of realistic GFETs with current silicon CMOS technology. GFETs slightly lag behind in maximum cut-off frequency FT,max up to a carrier mobility of 3000 cm2/Vs, where they can achieve similar RF performance as 65nm silicon FETs. While a strongly nonlinear voltage-dependent gate capacitance inherently limits performance, other parasitics such as contact resistance are expected to be optimized as GFET process technology improves.
Keywords
CMOS integrated circuits; MOSFET; carrier mobility; contact resistance; electrical conductivity; graphene; C; GFET process technology; RF performance; ambipolar behaviour; ballistic conductance; charge carrier mobilities; contact resistance; defects; dielectric environment; electronic device community; graphene MOSFET; high contact resistance; integrated graphene devices; logic analog radio frequency applications; maximum cut-off frequency; pristine graphene; realistic GFET; silicon CMOS technology; size 65 nm; standard CMOS technology; strongly nonlinear voltage-dependent gate capacitance; Dielectrics; Dispersion; Logic gates; Performance evaluation; Radio frequency; Silicon; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Silicon Nanoelectronics Workshop (SNW), 2012 IEEE
Conference_Location
Honolulu, HI
ISSN
2161-4636
Print_ISBN
978-1-4673-0996-7
Electronic_ISBN
2161-4636
Type
conf
DOI
10.1109/SNW.2012.6243322
Filename
6243322
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