Title :
Analysis of static noise margin and power-gating efficiency of a new nonvolatile SRAM cell using pseudo-spin-MOSFETs
Author :
Shuto, Yusuke ; Yamamoto, Shuu´ichirou ; Sugahara, Satoshi
Author_Institution :
ISEL, Tokyo Inst. Tech, Yokohama, Japan
Abstract :
Static noise margins (SNMs) and power-gating efficiency were computationally analyzed for our proposed nonvolatile SRAM (NV-SRAM) cell based on pseudo-spin-MOSFET (PS-MOSFET) architecture using spin-transfer-torque MTJs (STT-MTJs). The NV-SRAM cell has the same SNMs as an optimized 6T-SRAM cell. SNMs for other recently-proposed NV-SRAM cells using STT-MTJs were also evaluated, and we showed that their SNMs were deteriorated owing to the effect of the constituent STT-MTJs. Break-even time (BET) and power efficiency were analyzed for the NV-SRAM cell using PS-MOSFETs. The BET can be successfully minimized by controlling the bias of the cell. The average power dissipation can be effectively reduced by power-gating (PG) executions, and the further reduction is made possible by introducing a sleep mode.
Keywords :
MOSFET; SRAM chips; noise; average power dissipation; break-even time; nonvolatile SRAM cell; optimized 6T-SRAM cell; power efficiency; power-gating efficiency; power-gating executions; pseudospin-MOSFET architecture; sleep mode; spin-transfer-torque; static noise margin; Computer architecture; Inverters; Leakage current; MOSFET circuits; Microprocessors; Random access memory; Standards;
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2012 IEEE
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4673-0996-7
Electronic_ISBN :
2161-4636
DOI :
10.1109/SNW.2012.6243330