DocumentCode :
2652353
Title :
4kb nonvolatile nanogap memory (NGpM) with 1 ns programming capability
Author :
Takahashi, T. ; Furuta, S. ; Masuda, Y. ; Kumaragurubaran, S. ; Sumiya, T. ; Ono, M. ; Hayashi, Y. ; Shimizu, T. ; Suga, H. ; Horikawa, M. ; Naitoh, Y.
Author_Institution :
Funai Electr. Adv. Appl. Technol. Res. Inst. (FEAT), Tsukuba, Japan
fYear :
2012
fDate :
10-11 June 2012
Firstpage :
1
Lastpage :
2
Abstract :
A 4k bits nonvolatile high-speed nanogap memory device was fabricated with a newly developed vertical nanogap structure and its memory characteristics were evaluated. The newly developed vertical nanogap structures realized controllable electrode gap and higher yield compared to the initial phase lateral type nanogap structure. The structures were integrated on a CMOS chip. The specially embedded measurement circuit revealed programming speed from a low resistance state to a high resistance state (from on to off state) to be 1 ns.
Keywords :
CMOS integrated circuits; electrodes; random-access storage; CMOS chip; controllable electrode gap; high resistance state; lateral type nanogap structure; low resistance state; memory characteristics; nonvolatile high-speed nanogap memory device; programming capability; programming speed; specially embedded measurement circuit; vertical nanogap structure; Current measurement; Electrical resistance measurement; Electrodes; Fabrication; Programming; Semiconductor device measurement; Size measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2012 IEEE
Conference_Location :
Honolulu, HI
ISSN :
2161-4636
Print_ISBN :
978-1-4673-0996-7
Electronic_ISBN :
2161-4636
Type :
conf
DOI :
10.1109/SNW.2012.6243334
Filename :
6243334
Link To Document :
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