DocumentCode
2652543
Title
A compact high current "HIEF-source" for RFQ injection
Author
Volk, K. ; Ludwig, Thomas ; Klein, H. ; Leung, Ka Nang
Author_Institution
Universitat Frnkfurt
fYear
1993
fDate
1-3 June 1993
Firstpage
119
Lastpage
119
Keywords
Electrons; Ion beams; Kinetic theory; Laboratories; Plasma confinement; Plasma density; Plasma devices; Plasma materials processing; Plasma temperature; Production;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location
Tampa, FL, USA
Print_ISBN
0-7803-0716-X
Type
conf
DOI
10.1109/PLASMA.1992.697844
Filename
697844
Link To Document