DocumentCode :
2652543
Title :
A compact high current "HIEF-source" for RFQ injection
Author :
Volk, K. ; Ludwig, Thomas ; Klein, H. ; Leung, Ka Nang
Author_Institution :
Universitat Frnkfurt
fYear :
1993
fDate :
1-3 June 1993
Firstpage :
119
Lastpage :
119
Keywords :
Electrons; Ion beams; Kinetic theory; Laboratories; Plasma confinement; Plasma density; Plasma devices; Plasma materials processing; Plasma temperature; Production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
Type :
conf
DOI :
10.1109/PLASMA.1992.697844
Filename :
697844
Link To Document :
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