• DocumentCode
    2652543
  • Title

    A compact high current "HIEF-source" for RFQ injection

  • Author

    Volk, K. ; Ludwig, Thomas ; Klein, H. ; Leung, Ka Nang

  • Author_Institution
    Universitat Frnkfurt
  • fYear
    1993
  • fDate
    1-3 June 1993
  • Firstpage
    119
  • Lastpage
    119
  • Keywords
    Electrons; Ion beams; Kinetic theory; Laboratories; Plasma confinement; Plasma density; Plasma devices; Plasma materials processing; Plasma temperature; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
  • Conference_Location
    Tampa, FL, USA
  • Print_ISBN
    0-7803-0716-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.1992.697844
  • Filename
    697844