Title :
On the statistical trap-response (STR) method for characterizing random trap occupancy and NBTI fluctuation
Author :
Zou, Jibin ; Liu, Changze ; Wang, Runsheng ; Xu, Xiaoqing ; Liu, Jinhua ; Wu, Hanming ; Wang, Yangyuan ; Huang, Ru
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
In nanoscale devices with only a few oxide traps, characterization of trap response during NBTI stress is challenging due to the stochastic nature of trapping/detrapping behavior. This paper successfully extends the statistical trap-response (STR) method from DC to AC device operation, for getting a full understanding of the trap occupancy probability and the aging-induced dynamic variations under DC and AC NBTI. The AC trap response and the AC NBTI fluctuations are found largely deviating from the DC case, indicating different physical mechanisms.
Keywords :
MOSFET; fluctuations; probability; statistical analysis; AC NBTI fluctuations; AC trap response; DC-AC device operation; MOSFET; NBTI stress; STR method; aging-induced dynamic variations; nanoscale devices; random trap occupancy; statistical trap-response method; stochastic nature; trap occupancy probability; trapping-detrapping behavior; Clocks; Fluctuations; Logic gates; Probability; Stress; Stress measurement;
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2012 IEEE
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4673-0996-7
Electronic_ISBN :
2161-4636
DOI :
10.1109/SNW.2012.6243346