Title :
Strategy for in-line MOS transistor transport optimization
Author_Institution :
STMicroelectronics, TR&D/STD/TPS/ECR, Crolles, France
Abstract :
We show that short channel transistors transport can be efficiently monitored from in-line measurement of the low field mobility at constant effective gate length, possibly corrected from the Vth variations due to short channel effects. This measurement is independent from Cox, effective dimensions and access resistance, and well correlated to the saturation current variations.
Keywords :
MOSFET; optimisation; constant effective gate length; in-line MOS transistor transport optimization; in-line measurement; low field mobility; short channel effects; short channel transistors transport; Current measurement; Electrical resistance measurement; Length measurement; Logic gates; MOSFETs; Measurement uncertainty;
Conference_Titel :
Microelectronic Test Structures (ICMTS), 2011 IEEE International Conference on
Conference_Location :
Amsterdam
Print_ISBN :
978-1-4244-8526-0
Electronic_ISBN :
1071-9032
DOI :
10.1109/ICMTS.2011.5976860