DocumentCode :
2652714
Title :
Microsecond pulsed DC matching measurements on MOSFETs in strong and weak inversion
Author :
Andricciola, Pietro ; Tuinhout, Hans ; Wils, Nicole ; Schmitz, Jurriaan
Author_Institution :
Central R&D, NXP Semicond., Eindhoven, Netherlands
fYear :
2011
fDate :
4-7 April 2011
Firstpage :
90
Lastpage :
94
Abstract :
We present a first successful attempt to use microsecond DC pulses for matching measurements on 65-nm MOS transistors down to low current levels. We demonstrate that the interface states that contribute to the mismatch (if they indeed do so) in the weak and moderate inversion region must have charging and discharging time constants below 1 μs.
Keywords :
MOSFET; semiconductor device measurement; MOS transistors; MOSFET; microsecond pulsed DC matching measurements; size 65 nm; Correlation; Current measurement; Interface states; Logic gates; Pulse measurements; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures (ICMTS), 2011 IEEE International Conference on
Conference_Location :
Amsterdam
ISSN :
1071-9032
Print_ISBN :
978-1-4244-8526-0
Electronic_ISBN :
1071-9032
Type :
conf
DOI :
10.1109/ICMTS.2011.5976866
Filename :
5976866
Link To Document :
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