Title :
Metal/Ge Schottky barrier modulation with C-containing layer by chemical bath
Author :
Wang, Wei ; Wang, Jing ; Zhao, Mei ; Liang, Renrong ; Xu, Jun
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
Abstract :
We inserted a C-containing layer in a metal/Ge structure, using a chemical bath. This layer enabled the Schottky barrier height (SBH) to be modulated. The chemical bath with 1-octadecene and 1-dodecene were performed separately with Ge substrates. The ultrathin C-containing layer stops the penetration of free electron wave functions from the metal to the Ge. Metal-induced gap states are alleviated and the pinned Fermi level is released. The SBH is lowered to 0.17 eV. This new formation method is promising and much less complex than traditional ones.
Keywords :
Fermi level; Schottky barriers; elemental semiconductors; germanium; semiconductor-metal boundaries; wave functions; 1-dodecene; 1-octadecene; Ge; Ge substrates; SBH; Schottky barrier height; Schottky barrier modulation; chemical bath; free electron wave functions; metal-induced gap states; pinned Fermi level; ultrathin C-containing layer; Chemicals; Current density; Metals; Schottky barriers; Substrates; Surface cleaning; Tunneling;
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2012 IEEE
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4673-0996-7
Electronic_ISBN :
2161-4636
DOI :
10.1109/SNW.2012.6243359