DocumentCode
2653037
Title
Characterization of active channel processing by PIMR
Author
Heimlich, M.C. ; Gutmann, R.J. ; Kerber, L. ; Moreau, S. ; Vaughan, J.
Author_Institution
Rensselaer Polytechnic Institute, Troy, NY
fYear
1992
fDate
21-24 Apr 1992
Firstpage
291
Lastpage
298
Keywords
Annealing; Boron; Capacitance-voltage characteristics; Furnaces; Gallium arsenide; Implants; Ion implantation; MESFETs; Photoconductivity; Pulse measurements;
fLanguage
English
Publisher
ieee
Conference_Titel
Semi-Insulating III-V Materials, 1992 Proceedings of the 7th Conference on
Print_ISBN
0-7503-0242-9
Type
conf
DOI
10.1109/SIM.1992.752714
Filename
752714
Link To Document