Title :
State of the art of ECR ion sources
Author_Institution :
Lawrence Berkeley Lab., CA, USA
Abstract :
Electron Cyclotron Resonance (ECR) ion source which produces highly-charged ions is used in heavy ion accelerators worldwide. Applications also found in atomic physics research and industry ion implantation. ECR ion source performance continues to improve, especially in the last few years with new techniques, such as multiple-frequency plasma heating and better methods to provide extra cold electrons, combined with higher magnetic mirror fields. So far more than 1 emA of multiply-charged ions such as He2+ and O6+ , and 30 eμA of Au32+, 1.1 eμA of 238U 48+, and epA currents of very high charge states such as 86Kr35+ and 238U60+ have been produced
Keywords :
ion sources; plasma heating; 238U48+; 238U60+; 86Kr35+; Au; Au32+; ECR ion sources; He; He2+; Kr; O; O6+; U; cold electrons; plasma heating; Cyclotrons; Electrons; Ion accelerators; Ion implantation; Ion sources; Physics; Plasma accelerators; Plasma applications; Plasma immersion ion implantation; Resonance;
Conference_Titel :
Particle Accelerator Conference, 1997. Proceedings of the 1997
Conference_Location :
Vancouver, BC
Print_ISBN :
0-7803-4376-X
DOI :
10.1109/PAC.1997.752725
