DocumentCode :
2653539
Title :
Experimental Study for Low Resistance Interline Connections Using Pulsed Laser Techniques
Author :
Chung, Kuan-Jung ; Bernstein, Joseph B. ; Luo, JI ; Tuchman, J. Ari ; Ma, Zheng K.
Author_Institution :
Dept. of Mech. Eng., Maryland Univ., MD
Volume :
3
fYear :
2005
fDate :
27-27 May 2005
Firstpage :
1564
Lastpage :
1566
Abstract :
In this paper, experimental study was performed to evaluate the design of new four interline connect structures. The energy windows as well as optimal laser spot size were obtained from the experimental results, which show the minimum link resistance and highest yield. Accordingly above criteria, a best structure would be estimated
Keywords :
laser materials processing; optical design techniques; optical interconnections; energy windows; interline connect structure design; low resistance interline connections; minimum link resistance; optimal laser spot size; pulsed laser technique; Application specific integrated circuits; Field programmable analog arrays; Laser beam cutting; Laser modes; Laser theory; Metallization; Optical arrays; Optical pulses; Semiconductor lasers; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Conference_Location :
Baltimore, MD
Print_ISBN :
1-55752-796-2
Type :
conf
DOI :
10.1109/QELS.2005.1549208
Filename :
1549208
Link To Document :
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