DocumentCode
2653539
Title
Experimental Study for Low Resistance Interline Connections Using Pulsed Laser Techniques
Author
Chung, Kuan-Jung ; Bernstein, Joseph B. ; Luo, JI ; Tuchman, J. Ari ; Ma, Zheng K.
Author_Institution
Dept. of Mech. Eng., Maryland Univ., MD
Volume
3
fYear
2005
fDate
27-27 May 2005
Firstpage
1564
Lastpage
1566
Abstract
In this paper, experimental study was performed to evaluate the design of new four interline connect structures. The energy windows as well as optimal laser spot size were obtained from the experimental results, which show the minimum link resistance and highest yield. Accordingly above criteria, a best structure would be estimated
Keywords
laser materials processing; optical design techniques; optical interconnections; energy windows; interline connect structure design; low resistance interline connections; minimum link resistance; optimal laser spot size; pulsed laser technique; Application specific integrated circuits; Field programmable analog arrays; Laser beam cutting; Laser modes; Laser theory; Metallization; Optical arrays; Optical pulses; Semiconductor lasers; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Conference_Location
Baltimore, MD
Print_ISBN
1-55752-796-2
Type
conf
DOI
10.1109/QELS.2005.1549208
Filename
1549208
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