DocumentCode
2653570
Title
Thermal stress analysis of the microtoroid under CO2 laser
Author
Jiang, Guoqing ; Shubin Yan ; Yan, Shubin ; Xiong, Jijun
Author_Institution
Nat. Key Lab. For Electron. Meas. Technol., North Univ. of China, Taiyuan, China
fYear
2009
fDate
20-23 Oct. 2009
Firstpage
1023
Lastpage
1026
Abstract
The planar microtoroid with unique whispering gallery mode (WGM) has ultra-high Q value (UHQ) and better optical property. In order to get the UHQ cavity, it is very important to deal with the surface of microtoroid using CO2 laser reflow during the fabrication process. Because of the TEM00 laser output, there will be thermal stress which affects the Q value badly. In this paper, we design physical model and analyze the temperature distribution theoretically. Furthermore, thermal stress of different microtoroids has been tested with Raman Spectral Analyzer. At last we found that when the optical path is stabile and the lens is fixed the output power in the 7/1000 duty cycle of 30 minutes long pulse will have a good result.
Keywords
gas lasers; optical properties; spectral analysers; temperature distribution; thermal stresses; whispering gallery modes; Raman spectral analyzer; carbon dioxide laser reflow; optical property; planar microtoroid; temperature distribution; thermal stress analysis; ultra-high Q value; whispering gallery mode; Laser modes; Laser theory; Optical device fabrication; Semiconductor device modeling; Spectral analysis; Surface emitting lasers; Temperature distribution; Testing; Thermal stresses; Whispering gallery modes; CO2 laser; Raman frequency shift; microtoroid; thermal stress;
fLanguage
English
Publisher
ieee
Conference_Titel
ASIC, 2009. ASICON '09. IEEE 8th International Conference on
Conference_Location
Changsha, Hunan
Print_ISBN
978-1-4244-3868-6
Electronic_ISBN
978-1-4244-3870-9
Type
conf
DOI
10.1109/ASICON.2009.5351518
Filename
5351518
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