Title :
Vacuum Lithography For Nanostructure Fabrication Using Finely Focused Ion Beams
Author_Institution :
AT&T Bell Labs, Murray Hill, NJ
fDate :
29 Jul-2 Aug 1991
Keywords :
Conducting materials; Dry etching; Fabrication; Ion beams; Lithography; Nanostructured materials; Vacuum technology;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.639019
