DocumentCode
2654168
Title
Recent Progress In In Situ Electron-beam Lithography Of GaAs
Author
Sugimoto, Y. ; Akita, K. ; Kawanishi, H.
Author_Institution
Optoelectronics Technology Research Laboratory
fYear
1991
fDate
29 Jul-2 Aug 1991
Firstpage
64
Lastpage
65
Keywords
Atmosphere; Etching; Gallium arsenide; Laboratories; Lithography; Molecular beam epitaxial growth; Optical device fabrication; Pattern formation; Scanning electron microscopy; Surface cleaning;
fLanguage
English
Publisher
ieee
Conference_Titel
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN
0-87942-618-7
Type
conf
DOI
10.1109/LEOSST.1991.639021
Filename
639021
Link To Document