DocumentCode
2655909
Title
Efficient 13.5 nm EUV generation from a laser plasma
Author
Richardson, M. ; Koay, C.-S. ; Takenoshita, K. ; George, S. ; Bernath, R. ; Al-Rabban, M.M. ; Bakshi, V.
Author_Institution
Coll. of Opt. & Photonics, Univ. of Central Florida, Orlando, FL, USA
Volume
3
fYear
2005
fDate
22-27 May 2005
Firstpage
1947
Abstract
We describe a source of 13.5 nm radiation, based on multi-kHz laser-plasmas created from tin-bearing micro-droplets that has a high probability of satisfying the requirements for EUVL, the next generation lithography for computer chip fabrication.
Keywords
light sources; plasma confinement; plasma production by laser; plasma sources; tin; ultraviolet lithography; 13.5 nm; EUV generation; Sn; computer chip fabrication; laser plasma; lithography; radiation source; tin-bearing microdroplets; Atmospheric measurements; Bandwidth; Laser theory; Optical computing; Physics computing; Plasma measurements; Plasma properties; Plasma sources; Ultraviolet sources; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Print_ISBN
1-55752-796-2
Type
conf
DOI
10.1109/QELS.2005.1549337
Filename
1549337
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