DocumentCode :
26561
Title :
Sn-Based Group-IV Structure for Resonant Tunneling Diodes
Author :
Kun-Yuan Wu ; Bing-Hung Tsai ; Jia-Zhi Chen ; Guo-En Chang ; Mashanov, V.I. ; Cheng, H.H. ; Sun, Guofa ; Soref, Richard A.
Author_Institution :
Center for Condensed Matter Sci., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
34
Issue :
8
fYear :
2013
fDate :
Aug. 2013
Firstpage :
951
Lastpage :
953
Abstract :
We report a theoretical investigation on the electrical properties of a Sn-based group-IV structure for a resonant tunneling diode (RTD). The analysis on the composition-dependent strain, energy profile, and current-voltage characteristic of a double-barrier heterostructure shows that the peak current density and peak-to-valley ratio are enhanced with a moderated tensile strain in the barrier layer, providing an alternative approach for group-IV RTDs.
Keywords :
resonant tunnelling diodes; tin; Sn; barrier layer; double-barrier heterostructure; electrical properties; group-IV structure; peak current density; peak-to-valley ratio; resonant tunneling diodes; tensile strain; Current density; Resonant tunneling devices; Silicon; Tensile strain; Tin; Si-based resonant tunneling diodes (RTDs); SiGeSn alloys; peak current density; peak-to-valley ratio; strain-free QW; strained QW;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2266540
Filename :
6553587
Link To Document :
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