• DocumentCode
    2656608
  • Title

    Simulation of silicon nanowire tunneling field-effect transistors including quantum effects

  • Author

    Heigl, Alexander ; Wachutka, Gerhard

  • Author_Institution
    Inst. for Phys. ofElectrotechnology, Munchen
  • fYear
    2007
  • fDate
    12-14 Dec. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    To reduce the short channel effects in modern nanoscale MOS-devices alternative device concepts like the tunneling field effect transistor have been suggested (Hansch et al., 2000). Since the complete current is sustained by tunneling processes, these devices obey different design rules than MOSFETs. Another interesting approach is the use of multigate structures. A very promising idea is the combination of these two concepts. Using two-dimensional device simulations, we investigate the performance of such cylindrical nanowire tunneling transistors.
  • Keywords
    MIS devices; MOSFET; nanowires; semiconductor quantum wires; tunnel transistors; 2D device simulations; MOSFET; Si; nanoscale MOS-devices; nanowire tunneling transistors; quantum effects; silicon nanowire; tunneling field-effect transistors; Educational institutions; FETs; MOSFETs; Nanoscale devices; Photonic band gap; Quantum mechanics; Silicon; Solid modeling; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2007 International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-1892-3
  • Electronic_ISBN
    978-1-4244-1892-3
  • Type

    conf

  • DOI
    10.1109/ISDRS.2007.4422252
  • Filename
    4422252