DocumentCode :
2656608
Title :
Simulation of silicon nanowire tunneling field-effect transistors including quantum effects
Author :
Heigl, Alexander ; Wachutka, Gerhard
Author_Institution :
Inst. for Phys. ofElectrotechnology, Munchen
fYear :
2007
fDate :
12-14 Dec. 2007
Firstpage :
1
Lastpage :
2
Abstract :
To reduce the short channel effects in modern nanoscale MOS-devices alternative device concepts like the tunneling field effect transistor have been suggested (Hansch et al., 2000). Since the complete current is sustained by tunneling processes, these devices obey different design rules than MOSFETs. Another interesting approach is the use of multigate structures. A very promising idea is the combination of these two concepts. Using two-dimensional device simulations, we investigate the performance of such cylindrical nanowire tunneling transistors.
Keywords :
MIS devices; MOSFET; nanowires; semiconductor quantum wires; tunnel transistors; 2D device simulations; MOSFET; Si; nanoscale MOS-devices; nanowire tunneling transistors; quantum effects; silicon nanowire; tunneling field-effect transistors; Educational institutions; FETs; MOSFETs; Nanoscale devices; Photonic band gap; Quantum mechanics; Silicon; Solid modeling; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2007 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-1892-3
Electronic_ISBN :
978-1-4244-1892-3
Type :
conf
DOI :
10.1109/ISDRS.2007.4422252
Filename :
4422252
Link To Document :
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