DocumentCode
2656608
Title
Simulation of silicon nanowire tunneling field-effect transistors including quantum effects
Author
Heigl, Alexander ; Wachutka, Gerhard
Author_Institution
Inst. for Phys. ofElectrotechnology, Munchen
fYear
2007
fDate
12-14 Dec. 2007
Firstpage
1
Lastpage
2
Abstract
To reduce the short channel effects in modern nanoscale MOS-devices alternative device concepts like the tunneling field effect transistor have been suggested (Hansch et al., 2000). Since the complete current is sustained by tunneling processes, these devices obey different design rules than MOSFETs. Another interesting approach is the use of multigate structures. A very promising idea is the combination of these two concepts. Using two-dimensional device simulations, we investigate the performance of such cylindrical nanowire tunneling transistors.
Keywords
MIS devices; MOSFET; nanowires; semiconductor quantum wires; tunnel transistors; 2D device simulations; MOSFET; Si; nanoscale MOS-devices; nanowire tunneling transistors; quantum effects; silicon nanowire; tunneling field-effect transistors; Educational institutions; FETs; MOSFETs; Nanoscale devices; Photonic band gap; Quantum mechanics; Silicon; Solid modeling; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2007 International
Conference_Location
College Park, MD
Print_ISBN
978-1-4244-1892-3
Electronic_ISBN
978-1-4244-1892-3
Type
conf
DOI
10.1109/ISDRS.2007.4422252
Filename
4422252
Link To Document