Impact of nano particles on semiconductor manufacturing

Author

Wali, F. ; Knotter, D.M. ; Kuper, F.G.

Author_Institution

Fac. of Electr. Eng., Univ. of Twente, Nijmegen, Netherlands

fYear

2008

fDate

23-24 Dec. 2008

Firstpage

97

Lastpage

99

Abstract

Semiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nanoparticle present in ultra pure water on yield of up to 4-6 % has been found in two different products.

Keywords

contamination; nanoparticles; particle counting; regression analysis; semiconductor industry; semiconductor technology; transistors; defect density; nanoparticles; particle contamination; particle count; production tools; semiconductor manufacturing; Contamination; Electronics industry; Integrated circuit yield; Monitoring; Particle measurements; Pollution measurement; Semiconductor device manufacture; Size measurement; Water pollution; Water resources; Defect density; Linear regression; Particle contamination; Yield; component;

fLanguage

English

Publisher

ieee

Conference_Titel

Multitopic Conference, 2008. INMIC 2008. IEEE International

Conference_Location

Karachi

Print_ISBN

978-1-4244-2823-6

Electronic_ISBN

978-1-4244-2824-3

Type

conf

DOI

10.1109/INMIC.2008.4777715

Filename

4777715