Title :
Thermopile infrared detector fabricated with dry silicon etchant XeF2
Author :
Yang, Hengzhao ; Xiong, Bin ; Li, Tie ; Wang, Yuelin
Author_Institution :
Chinese Acad. of Sci., Shanghai
Abstract :
This paper presents a dry etching technique for removing bulk silicon in fabrication of thermopile. We first study the characteristics of XeF2 etching by performing a set of nine orthogonal experiments which are designed by using the Taguchi methods. Also included in this paper is a complete description of design, fabrication and test of thermopile released through this approach.
Keywords :
etching; infrared detectors; thermopiles; xenon compounds; Taguchi method; XeF2; bulk silicon removal; dry etching technique; dry silicon etchant; orthogonal experiment; thermopile infrared detector; Actuators; Dry etching; Educational institutions; Fabrication; Infrared detectors; Lithography; Shape; Silicon; Sputter etching; Testing;
Conference_Titel :
Semiconductor Device Research Symposium, 2007 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-1892-3
Electronic_ISBN :
978-1-4244-1892-3
DOI :
10.1109/ISDRS.2007.4422307
