Title :
Wire drawing tool for IC and MEMS CAD optimized for creating and editing wires on multiples of 45 degrees
Author :
Doering, Roger W. ; Arnaiz, C.I. ; Nakagawa, M.
Author_Institution :
California State Univ., East Bay
Abstract :
This software tool is a part of a research project developing a mask layout tool at CSU East Bay. Wires drawn at any angle may be drawn with most modern layout tools.
Keywords :
circuit layout CAD; integrated circuit layout; MEMS CAD; integrated circuit layout; mask layout tool; wire drawing tool; Computer science; Education; Educational institutions; Graphics; Integrated circuit layout; Mathematics; Micromechanical devices; Size control; Software tools; Wire drawing;
Conference_Titel :
Semiconductor Device Research Symposium, 2007 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-1892-3
Electronic_ISBN :
978-1-4244-1892-3
DOI :
10.1109/ISDRS.2007.4422339
