DocumentCode :
2658730
Title :
Breakdown effects on MOS varactors and VCOs
Author :
Sadat, Anwar ; Yang, Hong ; Xiao, Enjun ; Yuan, Jiann S.
Author_Institution :
Chip Design & Reliability Lab., Central Florida Univ., Orlando, FL, USA
fYear :
2003
fDate :
4-8 May 2003
Firstpage :
556
Lastpage :
559
Abstract :
The gate oxide breakdown effects of deep sub-micron devices, which degrade the performance of MOS varactors that in turn degrade the performance of LC voltage controlled oscillators (VCOs), are presented. On wafer 0.16 μm CMOS devices are stressed; experimental data are analyzed and used for analytical derivations and simulations to show that the breakdown has twofold effects on the performance of the VCOs. Firstly, the increased conductance of the varactor degrades its quality, which increases the phase noise of the VCOs. This also reduces the amplitude at the output of the oscillator. Secondly, the value of the capacitance of the MOS varactor reduces, which shifts the oscillation frequency of the VCOs.
Keywords :
MOS capacitors; phase noise; semiconductor device breakdown; semiconductor device noise; varactors; voltage-controlled oscillators; 0.16 micron; CMOS devices; MOS varactors; VCO; capacitance; complementary metal oxide semiconductor devices; conductance; deep submicron devices; gate oxide breakdown effects; metal oxide semiconductor varactors; oscillation frequency; phase noise; voltage controlled oscillators; Analytical models; Breakdown voltage; Capacitance; Data analysis; Degradation; Electric breakdown; Performance analysis; Phase noise; Varactors; Voltage-controlled oscillators;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium and PDA Exhibition Jointly with the 17th European Frequency and Time Forum, 2003. Proceedings of the 2003 IEEE International
ISSN :
1075-6787
Print_ISBN :
0-7803-7688-9
Type :
conf
DOI :
10.1109/FREQ.2003.1275151
Filename :
1275151
Link To Document :
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