DocumentCode :
2658880
Title :
2-Dimensional simulation and characterization of deep-submicron AlGaN/GaN HEMTs for high frequency applications
Author :
Gangwani, P. ; Kaur, Ravneet ; Pandey, Sujata ; Haldar, Subhasis ; Gupta, Mridula ; Gupta, R.S.
Author_Institution :
Univ. of Delhi, New Delhi
fYear :
2007
fDate :
12-14 Dec. 2007
Firstpage :
1
Lastpage :
2
Abstract :
This paper presents the characterization of deep-submicron AlGaN/GaN HEMTs for high performance applications, using ATLAS device simulator. The simulations reported in this work involve optimization of the investigated structure. The high RF performance of the device is attributed to the high quality of material and also to optimized device processing. The results are in good agreement with the experimental data as well as with the simulated data.
Keywords :
aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; ATLAS device simulator; AlGaN-GaN; RF performance; deep-submicron HEMT; high frequency applications; optimized device processing; two-dimensional simulation; Aluminum gallium nitride; Current density; Educational institutions; Frequency; Gallium nitride; HEMTs; MODFETs; Polarization; Transconductance; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2007 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-1892-3
Electronic_ISBN :
978-1-4244-1892-3
Type :
conf
DOI :
10.1109/ISDRS.2007.4422372
Filename :
4422372
Link To Document :
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