DocumentCode
2659426
Title
Thin film resonator technology
Author
Lakin, K.M.
Author_Institution
TFR Technol. Inc., Bend, OR, USA
fYear
2003
fDate
4-8 May 2003
Firstpage
765
Lastpage
778
Abstract
The thin film resonator technology has been under development for over forty years in one form or another. Although the basic approach is derived from the desire to reach higher frequencies than those readily achieved by thinning bulk crystals, there have always been competing technologies or fundamental material or processing problems that have impeded the development. Finally, a point was reached in the wireless market wherein competing technologies appeared unable to meet the demands of modern wireless applications and thin film approaches began to receive some emphasis. This paper will survey the thin film resonator technology. Every effort will be made to provide an objective analysis of the technology in relation to applications and competing technologies, and point out obstacles and promises, as known, for further technology advancement to high frequencies.
Keywords
crystal filters; crystal resonators; piezoelectric thin films; radiocommunication; thin film resonator; thinning bulk crystals; wireless applications; wireless market; Boundary conditions; Crystalline materials; Delay lines; Dielectric thin films; Microelectronics; Microwave frequencies; Piezoelectric films; Surface acoustic wave devices; Transistors; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium and PDA Exhibition Jointly with the 17th European Frequency and Time Forum, 2003. Proceedings of the 2003 IEEE International
ISSN
1075-6787
Print_ISBN
0-7803-7688-9
Type
conf
DOI
10.1109/FREQ.2003.1275190
Filename
1275190
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