Title :
UHF high-order radial-contour-mode disk resonators
Author :
Clark, John R. ; Abdelmoneum, Mohamed A. ; Nguyen, Clark T -C
Author_Institution :
Center for Wireless Integrated Microsyst., Michigan Univ., Ann Arbor, MI, USA
Abstract :
A micromechanical, laterally vibrating disk resonator, fabricated via a technology combining polysilicon surface-micromachining and metal electroplating to attain sub-micron lateral capacitive gaps, has been demonstrated at frequencies as high as 829 MHz and with Q´s as high as 23,000 at 193 MHz. Furthermore, the resonators have been demonstrated operating in the first three radial contour modes, allowing a significant frequency increase without scaling the device, and a 193 MHz resonator has been shown operating at atmospheric pressure with a Q of 8,880-evidence that vacuum packaging is not necessary for many applications. The geometric dimensions necessary to reach a given frequency are larger for this contour-mode than for the flexural-modes used by previous resonators. This, coupled with its unprecedented Q value, makes this disk resonator a choice candidate for use in the IF and RF stages of future miniaturized transceivers.
Keywords :
Q-factor; UHF devices; electroplating; elemental semiconductors; micromachining; micromechanical resonators; silicon; 193 MHz; 829 MHz; Q value; Si; UHF high order radial contour mode disk resonator; capacitive gap; metal electroplating; polysilicon surface micromachining; Electrodes; Electrostatics; Frequency measurement; Measurement techniques; Micromechanical devices; Packaging; Pollution measurement; Q measurement; Radio frequency; Transceivers;
Conference_Titel :
Frequency Control Symposium and PDA Exhibition Jointly with the 17th European Frequency and Time Forum, 2003. Proceedings of the 2003 IEEE International
Print_ISBN :
0-7803-7688-9
DOI :
10.1109/FREQ.2003.1275194