DocumentCode
2659528
Title
Optimized DRIE etching of ultra-small quartz resonators
Author
Chang, David T. ; Stratton, Frederic P. ; Kubena, Randall L. ; Joyce, Richard J.
Author_Institution
LLC, HRL Labs., Malibu, CA, USA
fYear
2003
fDate
4-8 May 2003
Firstpage
829
Lastpage
832
Abstract
Current manufacturing technology for quartz resonators does not provide a straightforward path for reducing the size and thereby increasing the frequency of operation into the UHF range. Using MEMS processing techniques and a commercial deep reactive ion etching (DRIE) tool, we are developing new techniques that may provide the ability to integrate large numbers of high performance filters onto a single chip for future handheld programmable communication systems.
Keywords
crystal resonators; micromechanical resonators; quartz; sputter etching; DRIE tool; MEMS; SiO2; UHF range; deep reactive ion etching tool; filter; programmable communication system; quartz resonator; Electrodes; Etching; III-V semiconductor materials; Plasma applications; Plasma devices; Plasma materials processing; Resists; Resonator filters; Silicon; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium and PDA Exhibition Jointly with the 17th European Frequency and Time Forum, 2003. Proceedings of the 2003 IEEE International
ISSN
1075-6787
Print_ISBN
0-7803-7688-9
Type
conf
DOI
10.1109/FREQ.2003.1275198
Filename
1275198
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