DocumentCode
2660562
Title
Stacked insulator induction accelerator gaps
Author
Houck, T.L. ; Westenskow, G.A. ; Kim, J.-S. ; Eylon, S. ; Henestroza, E. ; Yu, S.S. ; Vanecek, D.
Author_Institution
Lawrence Livermore Nat. Lab., CA, USA
Volume
3
fYear
1997
fDate
12-16 May 1997
Firstpage
3722
Abstract
Stacked insulators, with alternating layers of insulating material and conducting film, have been shown to support high surface electrical field stresses. We have investigated the application of the stacked insulator technology to the design of induction accelerator modules for the Relativistic-Klystron Two-Beam Accelerator program. The RF properties of the accelerating gaps using stacked insulators, particularly the impedance at frequencies above the beam pipe cutoff frequency, are investigated. Low impedance is critical for Relativistic-Klystron Two-Beam Accelerator applications where a high current, bunched beam is transported through many accelerating gaps. An induction accelerator module designs using a stacked insulator is presented
Keywords
collective accelerators; particle beam dynamics; RF properties; Relativistic-Klystron Two-Beam Accelerator program; beam pipe cutoff frequency; conducting film; high current bunched beam; high surface electrical field stresses; induction accelerator module designs; induction accelerator modules; insulating material; stacked insulator induction accelerator gaps; stacked insulator technology; stacked insulators; Acceleration; Cutoff frequency; Dielectrics and electrical insulation; Klystrons; Laboratories; Laser beams; Particle accelerators; Particle beams; Stress; Surface impedance;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1997. Proceedings of the 1997
Conference_Location
Vancouver, BC
Print_ISBN
0-7803-4376-X
Type
conf
DOI
10.1109/PAC.1997.753397
Filename
753397
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