• DocumentCode
    2660562
  • Title

    Stacked insulator induction accelerator gaps

  • Author

    Houck, T.L. ; Westenskow, G.A. ; Kim, J.-S. ; Eylon, S. ; Henestroza, E. ; Yu, S.S. ; Vanecek, D.

  • Author_Institution
    Lawrence Livermore Nat. Lab., CA, USA
  • Volume
    3
  • fYear
    1997
  • fDate
    12-16 May 1997
  • Firstpage
    3722
  • Abstract
    Stacked insulators, with alternating layers of insulating material and conducting film, have been shown to support high surface electrical field stresses. We have investigated the application of the stacked insulator technology to the design of induction accelerator modules for the Relativistic-Klystron Two-Beam Accelerator program. The RF properties of the accelerating gaps using stacked insulators, particularly the impedance at frequencies above the beam pipe cutoff frequency, are investigated. Low impedance is critical for Relativistic-Klystron Two-Beam Accelerator applications where a high current, bunched beam is transported through many accelerating gaps. An induction accelerator module designs using a stacked insulator is presented
  • Keywords
    collective accelerators; particle beam dynamics; RF properties; Relativistic-Klystron Two-Beam Accelerator program; beam pipe cutoff frequency; conducting film; high current bunched beam; high surface electrical field stresses; induction accelerator module designs; induction accelerator modules; insulating material; stacked insulator induction accelerator gaps; stacked insulator technology; stacked insulators; Acceleration; Cutoff frequency; Dielectrics and electrical insulation; Klystrons; Laboratories; Laser beams; Particle accelerators; Particle beams; Stress; Surface impedance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 1997. Proceedings of the 1997
  • Conference_Location
    Vancouver, BC
  • Print_ISBN
    0-7803-4376-X
  • Type

    conf

  • DOI
    10.1109/PAC.1997.753397
  • Filename
    753397