• DocumentCode
    2660699
  • Title

    A method of producing very high resistivity surface conduction on ceramic accelerator components using metal ion implantation

  • Author

    Liu, F. ; Brown, I. ; Philips, Lauren ; Biallas, G. ; Siggins, T.

  • Author_Institution
    Lawrence Berkeley Lab., CA, USA
  • Volume
    3
  • fYear
    1997
  • fDate
    12-16 May 1997
  • Firstpage
    3752
  • Abstract
    An important technique used for the suppression of surface flashover on high voltage DC ceramic insulators as well as for RF windows is that of providing some surface conduction to bleed off accumulated surface charge. We have used metal ion implantation to modify the surface of high voltage ceramic vacuum insulators to provide a uniform surface resistivity of approximately 5×1010 Ω/square. A vacuum arc ion source based implanter was used to implant Pt at an energy of about 135 keV to doses of up to more than 5×1016 ions/cm2 into small ceramic test coupons and also into the inside surface of several ceramic accelerator columns 25 cm I.D. by 28 cm long. Here we describe the experimental set-up used to do the ion implantation and summarize the results of our exploratory work on implantation into test coupons as well as the implantations of the actual ceramic columns
  • Keywords
    ceramic insulators; electrical resistivity; ion implantation; ion sources; particle accelerators; Pt; RF windows; ceramic accelerator components; high resistivity surface conduction; high voltage DC ceramic insulators; metal ion implantation; surface charge; surface flashover; vacuum arc ion source; Ceramics; Conductivity; Flashover; Insulation; Ion implantation; Metal-insulator structures; Radio frequency; Testing; Vacuum arcs; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 1997. Proceedings of the 1997
  • Conference_Location
    Vancouver, BC
  • Print_ISBN
    0-7803-4376-X
  • Type

    conf

  • DOI
    10.1109/PAC.1997.753407
  • Filename
    753407