DocumentCode :
2661122
Title :
Dense Plasma Focus X-ray Source For Lithography
Author :
Prasad, R. Raghu ; Krishnan, Mohan ; Mangano, J. ; Burkhalter, P. ; Maldonado, Jefferson
Author_Institution :
SRL
fYear :
1993
fDate :
1-3 June 1993
Firstpage :
145
Lastpage :
145
Keywords :
Capacitors; Condition monitoring; Fault location; Inductance; Insulation; Lithography; Plasma density; Plasma devices; Plasma sources; Plasma x-ray sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
Type :
conf
DOI :
10.1109/PLASMA.1992.697919
Filename :
697919
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2661122
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