Title :
Patterned magnetic recording media
Author :
Kikitsu, A. ; Kamata, Y. ; Sakurai, M. ; Naito, K.
Author_Institution :
Toshiba Corp., Kanagawa
fDate :
Nov. 29 2006-Dec. 1 2006
Abstract :
Recent progresses on the development of the patterned magnetic recording media are presented. There has been discussing several issues for the commercialization of the patterned media so far. The fabrication process by using nano imprint lithography seems to be possible solution of the productivity challenge. Good results on the flyability are also reported for the discrete track recording media. A couple of advantages for increasing the recording density have been reported regarding the system aspect. The patterned media is expected to be commercialized after the success of the discrete track media as a high density magnetic recording media
Keywords :
magnetic recording; nanolithography; soft lithography; discrete track media; etching; fabrication process; flyability; nano imprint lithography; patterned magnetic recording media; Commercialization; Disk recording; Electron beams; Fabrication; Lithography; Magnetic recording; Productivity; Sputter etching; Substrates; Throughput; etching; magnetic recording medium; nano imprint lithography; patterned media;
Conference_Titel :
Asia-Pacific Magnetic Recording Conference, 2006
Conference_Location :
Singapore
Print_ISBN :
1-4244-0863-6
DOI :
10.1109/APMRC.2006.365908
