DocumentCode :
2661228
Title :
High-Q Whispering Gallery Modes in Wet Etched Silica Microdisk Resonators Containing Silicon Nanocrystals
Author :
Kekatpure, R.D. ; Brongersma, M.L.
Author_Institution :
Geballe Lab. of Adv. Mater., Stanford Univ., CA
fYear :
2006
fDate :
13-15 Sept. 2006
Firstpage :
22
Lastpage :
24
Abstract :
We demonstrate coupling of room temperature photoluminescence (PL) emission from silicon nanocrystals (nc-Si) embedded in silicon-rich silicon oxide (SRSO) to whispering gallery modes (WGMs) of 10 mum radius microdisk resonators. The resonators were fabricated by wet chemical etching of circular patterns defined by electron beam lithography and display very smooth edges. We observe nearly degenerate counter-propagating WGMs from the microdisks and measure quality factors of Q>3500 for the fundamental mode at 850 nm - limited by the absorption loss from the nanocrystals
Keywords :
electron beam lithography; elemental semiconductors; etching; integrated optics; micro-optomechanical devices; micromechanical resonators; nanostructured materials; optical losses; photoluminescence; silicon; silicon compounds; whispering gallery modes; 10 micron; 293 to 298 K; 850 nm; Si-SiO2; absorption loss; electron beam lithography; high-Q whispering gallery modes; photoluminescence emission; quality factor measurement; silica microdisk resonator fabrication; silicon nanocrystals; wet chemical etching; Chemicals; Displays; Electron beams; Lithography; Nanocrystals; Photoluminescence; Silicon compounds; Temperature; Wet etching; Whispering gallery modes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2006. 3rd IEEE International Conference on
Conference_Location :
Ottawa, Ont.
Print_ISBN :
1-4244-0096-1
Type :
conf
DOI :
10.1109/GROUP4.2006.1708152
Filename :
1708152
Link To Document :
بازگشت