DocumentCode :
2661335
Title :
Limiting factors for SOI VLSI high-level hardness: modeling and improving
Author :
Leray, J.L. ; Dupont-Nivet, E. ; Péré, J.F. ; Musseau, O. ; Lalande, P. ; Umbert, A.
Author_Institution :
CEA-DAM, Bruyeres-Le-Chatel, France
fYear :
1989
fDate :
3-5 Oct 1989
Firstpage :
114
Lastpage :
115
Abstract :
Summary form only given. Some radiation hardness limiting mechanisms specific to SOI, at the elementary level and at the large-scale circuit level, are discussed. It is shown that LSI hardness at the 10 Megarad (Si) level is possible, and what kind of problems can be experienced beyond 100 Megarad (Si)
Keywords :
VLSI; elemental semiconductors; radiation hardening (electronics); semiconductor device models; semiconductor technology; semiconductor-insulator boundaries; silicon; 107 to 108 rad; SOI; VLSI; elementary level; high-level hardness; large-scale circuit level; limiting factors; modeling; radiation hardness limiting mechanisms; semiconductors; Board of Directors; Circuits; Large scale integration; Large-scale systems; Manufacturing; Propagation delay; Silicon; Substrates; Testing; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOS/SOI Technology Conference, 1989., 1989 IEEE
Conference_Location :
Stateline, NV
Type :
conf
DOI :
10.1109/SOI.1989.69793
Filename :
69793
Link To Document :
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