Title :
Numerical simulation of advanced RF plasma sources
Author :
Montalvo ; Carrera ; Lebrun, M. ; Pekker, L. ; Godyak, V.
Author_Institution :
Valley research Corporation
Keywords :
Equations; Numerical simulation; Plasma applications; Plasma density; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma sources; Plasma waves; Radio frequency;
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
DOI :
10.1109/PLASMA.1992.697934